EMISSIONS CHARACTERIZATION OF ADVANCED CVD PROCESSES AND ABATEMENT PERFORMANCE

摘要

Process and emissions of advanced chemical vapor deposition and plasma-enhanced chemical vapor deposition processes are characterized for several atypical CVD processes using quadrupole mass spectrometry (QMS), Fourier transform infrared (FTIR) spectroscopy, and Fourier transform ion cyclotron resonance (FTICR) mass spectrometry. Data are shown for process emissions using tetrakis-dimethylamino titanium (TDMAT) in a CVD/PECVD chamber for Ti/TiN deposition as well as abatement performance of the dimethylamine and ammonia byproducts. Process and abatement data are also shown for bis(tertiary-butylamino)silane (BTBAS), an organosilane used for lower temperature LPCVD. In addition, two high-k deposition applications are shown, demonstrating that FTIR can be used to provide useful process diagnostics. Included is discussion of an ALCVD process using trimethyl aluminum (Al(C_H3)_3 and HfCl_4 for Al_2O_3 and HfO_2 deposition.