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Miniature integrated optic Fabry-Perot slit interferometer

机译:微型集成光学法布里-珀罗狭缝干涉仪

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Abstract: A miniature Fabry-Perot cavity consists of a 10 micron deep by 5 micron wide slit which is formed in a silica (SiO$-2$/) waveguide over silicon with the use of reactive ion etching. The multiple beam interference is due to successive reflections from both walls of the slit. The reflectance close to the critical angle exhibits a Finesse over 20. A model is developed to simulate the loss due to scattering from the etched wall roughness. The loss in amplitude is only 7% after each reflection. Thus, the etched walls are vertical and smooth and can be used as efficient mirrors in integrated-optical circuits and interferometers. !0
机译:摘要:微型Fabry-Perot空腔由10微米深乘5微米宽的狭缝组成,该狭缝通过反应离子刻蚀在硅上的二氧化硅(SiO $ -2 $ /)波导中形成。多光束干涉是由于缝隙两壁的连续反射引起的。接近临界角的反射率显示出超过20的Finesse。开发了一个模型来模拟由于蚀刻壁粗糙度造成的散射而导致的损耗。每次反射后,振幅损失仅为7%。因此,蚀刻的壁是垂直且光滑的,并且可以用作集成电路和干涉仪中的有效反射镜。 !0

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