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SrTiO_3 Thin Film Varactors on Si for Microwave Applications

机译:用于微波的Si上SrTiO_3薄膜变容二极管

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Dielectric properties of SrTiO_3 (STO) thin films in Au/Pt/STO/Pt/TiO_2/SiO_2/Si structure are studied at microwave frequencies. STO films with thickness of 300 nm were grown by laser ablation at different temperatures on templates of Pt/TiO_2/SiO_2 on Si with resistivity of 5 kΩ·cm. XRD measurements reveal highly textured (111)STO films with small amount of (100) and (110) domains. The full with at half maximum of the rocking curve of (111 )STO domains is about 2 degrees. Circular Au/Pt top electrodes with diameters in the range of 10-60 μm were formed by e-beam evaporation and lift-off process. The on chip microwave impedance of devices was measured in the frequency range of 45 MHz-45 GHz as a function of DC electric field in the range of 0-800 kV/cm. The loss tangent is less than 0.06 in the whole frequency range. Application of DC bias results in resonant absorption of microwave power at frequencies of 1.3, 3.0, 4.7, 6.4, and 9.7 GHz. The relative change of the dielectric permittivity under 800 kV/cm DC field is more than 20% in the whole frequency range. The results indicate that the varactors based on these STO films are suitable for tunable microwave applications.
机译:研究了微波频率下Au / Pt / STO / Pt / TiO_2 / SiO_2 / Si结构的SrTiO_3(STO)薄膜的介电性能。在不同温度下通过激光烧蚀在硅上的Pt / TiO_2 / SiO_2模板上以5kΩ·cm的电阻率生长厚度为300 nm的STO膜。 XRD测量显示出具有少量(100)和(110)域的高度织构化(111)STO膜。 (111)STO域的摇摆曲线的一半处充满,大约为2度。通过电子束蒸发和剥离工艺形成直径为10-60μm的圆形Au / Pt顶部电极。在45 MHz-45 GHz的频率范围内,根据0-800 kV / cm范围内的直流电场,测量了器件的片上微波阻抗。在整个频率范围内,损耗角正切值小于0.06。施加直流偏置会导致微波功率在1.3、3.0、4.7、6.4和9.7 GHz的频率下共振吸收。在整个频率范围内,在800 kV / cm直流电场下,介电常数的相对变化超过20%。结果表明,基于这些STO薄膜的变容二极管适用于可调微波应用。

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