Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition

摘要

Abstract: A system has been developed using extractive FTIR techniques to characterize the gaseous emissions from semiconductor wafer process tools. The system provides real-time data collection, processing and display for multiple compounds simultaneously. Tool effluent emission profiles that track concentrations are produced with time resolutions on the order of seconds. Along with a description of the hardware, sampling and analysis methods, the results of some field testing and system validations are also presented. !2