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Effects of Doping, Strain and Size on the electrical properties of MoS_2 Nanoribbons

机译:掺杂,应变和尺寸对MoS_2纳米带电性能的影响

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摘要

In this work, we have investigated size, doping and strain effect on the electrical properties of n-type and p-type MoS_2 monolayer, one of the most interesting two-dimensional layered materials. We found that the bandgap of the MoS_2 will reduce from 1.8 eV to 1.2 eV as the infinite lattice being shrunk into 10×10 nanoribbon. The electrical properties of a nanoscale MoS_2 monolayer exhibited large variation (≈20%) as its doping level or dopant position changes, although the band-gap varies slightly. The study on the strain effect indicates that the bandgap of infinite MoS_2 monolayer monotonically reduces as the increasing of the strain strength. The variation in electrical properties induced by size, doping and strain effect may post a serious challenge on the application in logic and memory devices.
机译:在这项工作中,我们研究了尺寸,掺杂和应变对n型和p型MoS_2单层(一种最有趣的二维层状材料)的电性能的影响。我们发现,随着无限晶格收缩成10×10纳米带,MoS_2的带隙将从1.8 eV降低到1.2 eV。纳米级MoS_2单层的电性能随其掺杂水平或掺杂位置的变化而显示出较大的变化(≈20%),尽管带隙变化很小。应变效应研究表明,无限大的MoS_2单层带隙随着应变强度的增加而单调减小。由尺寸,掺杂和应变效应引起的电性能变化可能对逻辑和存储设备中的应用提出严峻挑战。

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  • 会议地点 Cancun(MX)
  • 作者单位

    Department of Electrical and Computer Engineering, George Mason University, Fairfax, VA 22030, USA;

    Department of Electrical and Computer Engineering, George Mason University, Fairfax, VA 22030, USA;

    Department of Electrical and Computer Engineering, George Mason University, Fairfax, VA 22030, USA;

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