首页> 外文会议>Conference on Ultrafast Phenomena in Semiconductors Ⅴ Jan 25-26, 2001, San Jose, USA >Hot Phonon Effects on the Ultrafast Relaxation of Photoexcited Electrons in A1N
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Hot Phonon Effects on the Ultrafast Relaxation of Photoexcited Electrons in A1N

机译:热声子对A1N中光激发电子超快弛豫的影响

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摘要

The effects of hot phonons on the ultrafast relaxation of photoexcited electrons in A1N has been investigated using ensemble Monte Carlo approach. The electrons are excited using infra-red laser pulses with different densities and energies. The build-up and decay of the hot phonon distribution at several phonon wavevectors is examined. The strong polar optical phonon scattering rates coupled with the short lifetimes of A(LO) leads to quick decay of the hot phonon distributions. Additionally, the rapid electron-electron scattering leads to fast thermalization of the carrier distributions.
机译:使用集成蒙特卡洛方法研究了热声子对AlN中光激发电子超快弛豫的影响。使用具有不同密度和能量的红外激光脉冲来激发电子。研究了在几个声子波矢处热声子分布的建立和衰减。强极性光子的声子散射速率加上A(LO)的短寿命会导致热声子分布快速衰减。另外,快速的电子-电子散射导致载流子分布的快速热化。

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