Interfacial misfit dislocation array based growth of III-Sb active regions on GaAs/AlGaAs DBRs for high-power 2 μm VECSELs

摘要

This presentation will overview the growth of an IMF based VECSEL structure operating at 2 μm with an InGaSb QW active region (a_0 = 6.09 A) on GaAs/AlGaAs distributed bragg reflectors (DBR) (a_0 = 5.65 A). The use of the GaAs substrate instead of GaSb results in a significant reduction in the surface defect density while allowing the use of a mature GaAs/AlGaAs DBR technology. We shall provide photoluminescence results from 2 μm IMF based active regions grown on GaAs substrates and compare the results with the same active regions grown on GaSb substrates. We shall also provide extensive transmission electron microscopy, surface morphology and high-resolution x-ray diffraction analysis of the material grown.