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Advanced analysis of high-temperature failure mechanisms in telecom lasers

机译:电信激光器高温故障机理的高级分析

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Laser performance degradation at elevated temperature often requires the use of costly cooling devices. Much effort has been devoted to understand and overcome the high-temperature failure of laser diodes used in telecommunication applications (wavelength 1.3-1.6 μm). Various physical mechanisms have been proposed to explain high-temperature effects, including Auger recombination, carrier leakage, intervalence-band absorption, gain reduction and others. The discussion of the dominating effects is still controversial. One reason for this controversy is the use of simplified theoretical models that emphazise selected mechanisms. One-sided models lead to onesided interpretations of measurements. In this paper, high-temperature measurements on InP laser diodes are analyzed using a comprehensive laser model that includes all relevant physical mechanisms self-consistently. The software combines two-dimensional carrier transport, heat flux, strained quantum well gain computation, and optical wave guiding with a longitudinal mode solver. Careful adjustment of material parameters leads to an excellent agreement between simulation and measurements at all temperatures. At lower temperatures, Auger recombination controls the threshold current. At high temperatures, vertical electron leakage from the separate confinement layer is the main cause of performance degradation. The increase of internal absorption is less important. However, all these carrier and photon loss enhancements with higher temperature are mainly triggered by the reduction of the optical gain due to Fermi spreading of carriers.
机译:高温下激光器性能的下降通常需要使用昂贵的冷却装置。为了了解和克服电信应用中使用的激光二极管的高温故障(波长为1.3-1.6μm),已经付出了很多努力。已经提出了各种物理机制来解释高温效应,包括俄歇复合,载流子泄漏,间隔带吸收,增益降低等。关于主导作用的讨论仍存在争议。引起争议的原因之一是使用简化的理论模型来强调选定的机制。单面模型导致对测量的单面解释。在本文中,使用综合激光模型对InP激光二极管上的高温测量进行了分析,该模型自洽地包括了所有相关的物理机制。该软件将二维载流子传输,热通量,应变量子阱增益计算和光波导与纵向模式求解器结合在一起。仔细调整材料参数会导致在所有温度下的仿真和测量之间的出色一致性。在较低温度下,俄歇复合控制阈值电流。在高温下,垂直电子从单独的限制层泄漏是性能下降的主要原因。内部吸收的增加不太重要。但是,所有这些载流子和光子损耗随温度升高的增强主要是由于载流子的费米扩散引起的光学增益的降低而引起的。

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