首页> 外文会议>Conference on Semiconductor Lasers and Laser Dynamics; 20040427-20040430; Strasbourg; FR >Nonlinear refractive index and pattern-effects-free cross-phase modulation in quantum dot semiconductor optical amplifiers
【24h】

Nonlinear refractive index and pattern-effects-free cross-phase modulation in quantum dot semiconductor optical amplifiers

机译:量子点半导体光放大器中的非线性折射率和无图案效应的交叉相位调制

获取原文
获取原文并翻译 | 示例

摘要

We have developed a theory of the nonlinear refractive index in Quantum Dot (QD) Semiconductor Optical Amplifiers (SOAs) due to Spectral Hole Burning (SHB). Estimates show that this SHB nonlinear refractive index can be of order of 4 · 10~(-16) m~2/W that is by four orders higher than the nonlinear refractive index in silica, and offers the possibility of an efficient ultrafast Cross-Phase-Modulation (XPM) in QD SOAs. The opportunity of XPM without patterning effects via this refractive index nonlinearity is discussed. The Pattern-Effect-Free (PEF) XPM is possible in QD SOAs at high pumps, when maximal (constant) gain is achieved in SOAs, and the linear and nonlinear refractive indices also become independent of the total carrier density in the QD structure. In whole, use of the ultrafast refractive index nonlinearity in the regime of maximum gain in QD SOAs can lead to the development of a new generation of nonlinear interferometers for ultrafast optical switching.
机译:我们已经开发了由于光谱空穴燃烧(SHB)而在量子点(QD)半导体光放大器(SOA)中产生非线性折射率的理论。估算表明,该SHB非线性折射率约为4·10〜(-16)m〜2 / W,比二氧化硅中的非线性折射率高四个数量级,并提供了有效的超快Cross- QD SOA中的相位调制(XPM)。讨论了通过这种折射率非线性而没有图案效应的XPM机会。在高泵浦的QD SOA中,当SOA获得最大(恒定)增益时,无图案效应(PEF)XPM是可能的,并且线性和非线性折射率也变得独立于QD结构中的总载流子密度。总体而言,在QD SOA的最大增益范围内使用超快折射率非线性可导致开发用于超快光学开关的新一代非线性干涉仪。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号