首页> 外文会议>Conference on Materials and Devices for Optical and Wireless Communications, Oct 15-18, 2002, Shanghai, China >Characterisation of 1.3μm wavelength GaInNAs/GaAs edge-emitting and Vertical-cavity surface-emitting lasers using low-temperature and high-pressure
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Characterisation of 1.3μm wavelength GaInNAs/GaAs edge-emitting and Vertical-cavity surface-emitting lasers using low-temperature and high-pressure

机译:使用低温和高压表征1.3μm波长的GaInNAs / GaAs边缘发射和垂直腔表面发射激光器

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By measuring the spontaneous emission from normally operating ~1.3μm GaInNAs/GaAs-based lasers grown by MBE and by MOVPE we have quantitatively determined the variation of monomolecular (defect-related ~An), radiative (~Bn~2) and Auger recombination (~Cn~3) as a function of temperature from 130K to 370K. We find that A, B and C are remarkably independent of the growth method. Theoretical calculations of the threshold carrier density as a function of temperature were also performed using a 10 band k·p Hamiltonian from which we could determine the temperature variation of A, B and C. At 300K, A≈ 11x10~(-8) sec~(-1), B≈ 8x10~(-11) cm~3 sec~(-1) and C≈ 6x10~(-29) cm~6 sec~(-1). These are compared with theoretical calculations of the coefficients and good agreement is obtained. Our results suggest that by eliminating defect-related currents and reducing optical losses, the threshold current density of these GaInNAs/GaAs-based edge-emitting devices would be more than halved at room temperature. The results from studies of temperature and pressure variation of ~1.3μm VCSELs produced by similar MBE growth could also be explained using the same recombination coefficients. They showed a broad gain spectrum and were able to operate over a wide temperature range.
机译:通过测量MBE和MOVPE正常生长的〜1.3μmGaInNAs / GaAs基激光器的自发发射,我们定量确定了单分子(与缺陷有关的〜An),辐射(〜Bn〜2)和俄歇复合的变化( 〜Cn〜3)作为温度从130K到370K的函数。我们发现,A,B和C显着独立于生长方法。还使用10波段k·p哈密顿量进行了阈值载流子密度随温度变化的理论计算,由此可以确定A,B和C的温度变化。在300K时,A≈11x10〜(-8)sec 〜(-1),B≈8x10〜(-11)cm〜3秒〜(-1)和C≈6x10〜(-29)cm〜6秒〜(-1)。将这些与系数的理论计算进行比较,并获得了很好的一致性。我们的结果表明,通过消除与缺陷相关的电流并减少光损耗,这些基于GaInNAs / GaAs的边缘发射器件的阈值电流密度在室温下将减少一半以上。通过相似的MBE生长产生的〜1.3μmVCSEL的温度和压力变化的研究结果也可以用相同的重组系数来解释。它们显示了宽广的增益谱,并且能够在较宽的温度范围内工作。

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