Laser nanocrystallization of the amorphous silicon with and without metal introduction

摘要

Laser nanocrystallization of the amorphous silicon (a-Si) deposited on Si (100) or glass substrate with and without metal catalyst is investigated. SEM results indicate that the surface morphology is presented as many nanograins are studded on the former's surface after crystallization, whereas, only with plenty of spots scattering on the latter's surface. HRTEM studies show that the nanograins are Si nanocrystallites and the spots are actually crystalline Si nanowires. Further analysis on the crystallizing process of the two kinds of annealing has been performed to explain the morphology difference of two kinds of annealing techniques.