首页> 外文会议>Conference on Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; Aug 4-6, 2003; San Diego, California, USA >Characterization of the high-Z 0.9-1.0 MA x-pinch source in the 0.15 ― 500 keV region. Possible applications of the high-current x-pinch as the sub-keV-10 keV radiation driver and the 50-100 keV backlighter
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Characterization of the high-Z 0.9-1.0 MA x-pinch source in the 0.15 ― 500 keV region. Possible applications of the high-current x-pinch as the sub-keV-10 keV radiation driver and the 50-100 keV backlighter

机译:在0.15到500 keV范围内表征高Z 0.9-1.0 MA x捏合源。大电流X夹作为副keV-10 keV辐射驱动器和50-100 keV背光源的可能应用

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摘要

Experimental results of complex studies of x-ray/EUV radiation from hot dense x-pinch Ti, Fe, Mo, and W plasmas generated by a pulse-powered z-pinch machine with I_(max)~0.9/1.0 MA and a current rise time of 100 ns are overviewed. Structures and spatial dimensions of 0.9-1.0 MA x-pinch sources in a wide energy range of 0.15-0.6 keV, 1-10 keV and 10-100 keV are analyzed. Generation of different types of hot spots in high-current multiburst x-pinches are described and a possible explanation of observed effects based on generation of Shockwaves in plasmas are discussed. Hard x-ray, x-pinch spectra are analyzed. The analysis of time and energy scaling of 0.9-1.0 MA x-pinch x-ray/EUV pulses indicate the possible existence of competing mechanisms of the dissipation of the initial discharge x-pinch energy. The future applications of the high current x-pinch as the sub-keV-10 keV radiation driver and the 50-100 keV backlighter are discussed.
机译:电流为I_(max)〜0.9 / 1.0 MA的脉冲供电z捏合机产生的热致密x捏合Ti,Fe,Mo和W等离子体的X射线/ EUV辐射的复杂研究的实验结果概述了100 ns的上升时间。分析了0.9-1.0 MA x捏合源在0.15-0.6 keV,1-10 keV和10-100 keV的宽能范围内的结构和空间尺寸。描述了在高电流多重爆发x形夹中生成不同类型热点的情况,并讨论了基于等离子体中激波产生的观测效应的可能解释。分析了硬X射线,X捏谱。对0.9-1.0 MA X捏x射线/ EUV脉冲的时间和能量定标的分析表明,可能存在初始放电x捏能量耗散的竞争机制。讨论了大电流x夹作为keV-10 keV辐射驱动器和50-100 keV背光源的未来应用。

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