首页> 外文会议>CleanTech'99: International Cleaning Technology Exposition, May 18-20, 1999, Rosemont, IL >Implications of Replacing 1,1,1 Trichloroethane with N-propyl Bromide for Vapor Solvent Removal of RMA Flux From Printed Wiring Boards
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Implications of Replacing 1,1,1 Trichloroethane with N-propyl Bromide for Vapor Solvent Removal of RMA Flux From Printed Wiring Boards

机译:用N-丙基溴代替1,1,1三氯乙烷对于从印刷线路板中去除RMA助焊剂的溶剂

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摘要

After RMA flux-assisted hand and wave soldering of components onto printed wiring boards (PWBs), the flux must be removed in order to meet low ionic contamination requirements. Lockheed-Martin, and much of the astronautics and aeronautics industries, have traditionally used 1,1,1 trichloroethane to remove RMA flux after soldering. However, this ozone depleting compound (ODC) was eliminated from use on all work at Lockheed-Martin by December of 1997. This paper discusses the extensive research that was done in choosing a non-ODC vapor cleaning solvent among other possible cleaning methods, and also the choice of N-propyl bromide (nPB) among other possible vapor cleaning solvents. Finally, the problems and benefits of cleaning and stripping with nPB since we made the switch-out in October of 1997 is discussed. This presentation will be useful to others in the electronics industry who are considering alternatives to an ODC solvent for PWB cleaning and stripping.
机译:在将RMA助焊剂手工和波峰焊到印刷线路板(PWB)上之后,必须去除助焊剂以满足低离子污染的要求。洛克希德·马丁公司(Lockheed-Martin)以及许多航空航天工业传统上都使用1,1,1三氯乙烷在焊接后去除RMA助焊剂。但是,到1997年12月,这种消耗臭氧层的化合物(ODC)在洛克希德·马丁公司的所有工作中均被淘汰。本文讨论了在选择其他非可能的清洁方法中使用非ODC蒸汽清洁溶剂的广泛研究,以及除其他可能的蒸汽清洁溶剂外,还应选择N-丙基溴(nPB)。最后,讨论了自从我们于1997年10月退出以来使用nPB进行清洁和剥离的问题和好处。该演示文稿对于正在考虑使用ODC溶剂替代PWB清洗和剥离的电子行业中的其他人很有用。

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