The effect of crystallization annealing temperature on the phase transformation temperature in Ti-rich NiTi thin films prepared by the magnetron-sputtering system has been sutuded. The experiemntal resuts shown that the phase transforation sequence of Ti-rich NiTi thin films are P-R-M for cooling transformation and R-P and M-P for heating one. while ncreasing the annealing temperature from 823K to 1103K , the R-phae transformation temperature T_p-r and T_r-p are nearly no change. the martensitic transformation temperatures. however, move to higher temperature. A thin film with micro-structure consisting of almost whole R-phase at room teperature can be obtained by annealing at an approprate teperature (e.g. at 923
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