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Thickness dependent evolution of microstructure and magnetic properties of L10 (001) FePt films grown on TiN intermediate layer

机译:TiN中间层上生长的L10(001)FePt薄膜的微观结构和磁性能的厚度依赖性演化

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The evolution of the microstructure and magnetic properties of FePt films with different thicknesses fabricated by dc magnetron sputtering on TiN intermediate layer were investigated. MFM results showed that the magnetization reversal mechanism changed from Stoner-Wohlfarth rotation to domain wall motion with increasing film thickness. SEM and TEM images revealed that the morphologies of the films evolved from island particle to maze-like grains and then continuous films with the increase of the FePt film thickness. The critical thickness for FePt/TiN epitaxial growth was estimated to be 10 nm by lattice constant simulation and TEM measurement. The lattice relaxation in the FePt film of 40 nm was determined by high-resolution TEM images.
机译:研究了通过直流磁控溅射在TiN中间层上制备的不同厚度的FePt膜的微观结构和磁性能的变化。 MFM结果表明,随着膜厚度的增加,磁化反转机理从斯托纳-沃尔法斯旋转变为畴壁运动。 SEM和TEM图像表明,随着FePt膜厚度的增加,膜的形貌从岛状颗粒演变为迷宫状颗粒,然后形成连续膜。通过晶格常数模拟和TEM测量,FePt / TiN外延生长的临界厚度估计为10 nm。通过高分辨率TEM图像确定了40 nm的FePt膜中的晶格弛豫。

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