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A New Excimer-Laser-Aniiealing Method for Manufacturing Large OLED Displays

机译:用于制造大型OLED显示器的新型准分子激光分析方法

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In this paper, we present an example of a new generation of laser-crystallization approaches that can crystallize Si films for large active-matrix displays at drastically increased effective crystallization rates. The particular scheme presented in this paper is referred to as the advanced excimer-laser-annealing (AELA) method, and it can be readily configured for manufacturing large OLED TVs using various available and field-proven technical components. As in ELA, it is mostly a partiaNear-complete-melting-regiine-based crystallization approach; AELA can, however, eventually achieve greater than one order of magnitude increase in the effective rate of crystallization over that of the conventional ELA technique utilizing the same laser source. We discuss in this paper how and why such a dramatic increase can be attained, and some strategical and technological benefits and options that can be entertained regarding, and as a result of the availability of, the AELA technique.
机译:在本文中,我们提供了一个新一代激光结晶方法的示例,该方法可以以大幅度提高的有效结晶速率来结晶大型有源矩阵显示器的硅膜。本文中提出的特定方案称为高级准分子激光退火(AELA)方法,可以使用各种可用的且经过现场验证的技术组件轻松配置为制造大型OLED电视。与ELA一样,它主要是基于部分/接近完全熔化的区域的结晶方法。但是,与使用相同激光源的常规ELA技术相比,AELA最终可以使有效结晶速率提高大于一个数量级。在本文中,我们将讨论如何以及为什么可以实现如此惊人的增长,以及关于AELA技术以及由于其可用性而可以考虑的一些战略和技术优势以及选择。

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