ESRF metrology laboratory: overview of instrumentation, measurement techniques and data analysis

摘要

The ESRF has initiated an ambitious ten-year upgrade program involving the construction of eight new beamlines and significant refurbishment of existing instruments. The availability of high-precision X-ray optical elements will be a key factor in ensuring the successful implementation of these beamline projects. Particular challenges are to ensure the necessary optical quality for X-ray beam coherence preservation and high numerical-aperture high focusing systems. Surface optical metrology is a key tool, not only for the quality control, but also in improving the manufacturing processes of such components. Amongst the most demanding tasks is the characterisation of the surface topography of highly aspheric surfaces for reflective nanofocusing technologies which typically require measurement of shape errors in the nm range.