Multi-source, complex beamline modeling development in MICHELLE-eBEAM

摘要

Simulations of modern, high current electron beam lithography devices may require modeling of optical components and multiple electron sources that are positioned both aligned with, and oblique to, the main device axis. Such devices may include counter streaming regions, where two beams are co-located in space while propagating in opposite directions. Modeling such complex multi-beam systems presents different computational challenges depending on the specific device and regime being modeled. Applications of interest require in some cases the modeling of both global and stochastic space charge, where inclusion of the latter requires direct evaluation of Coulomb interactions.