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Microstructure and Magnetostriction of Sm-Fe GMFs

机译:Sm-Fe GMFs的微观结构和磁致伸缩

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In this paper, both technologies of ion beam sputtering deposition (IBSD) and vacuum casting alloy target were used to fabricate Sm-Fe giant magnetostrictive thin films (Sm-Fe GMFs). The films were annealed at different temperatures under vacuum condition. The results showed that under the fixed fabrication procedure of IBSD, compact amorphous Sm-Fe GMFs with smooth surface and high interfacial adhesion had been deposited. With post-annealing temperature rising, the microstructure of the films had been changed as following order: amorphous → amorphous+microcrystalline→nano-polycrystalline (crystallization temperature was about 400℃), and magnetostriction of films had changed as well. It was note that after properly annealing, the magnetostriction of Sm-Fe GMFs could be drastically improved (λ could reach about -350×10-6 at an applied magnetic field of SOKA·m-1).
机译:在本文中,离子束溅射沉积(IBSD)技术和真空铸造合金靶都被用于制造Sm-Fe巨磁致伸缩薄膜(Sm-Fe GMFs)。将膜在真空条件下在不同温度下退火。结果表明,在IBSD固定的制备工艺下,沉积了具有光滑表面和高界面附着力的致密无定形Sm-Fe GMF。随着退火后温度的升高,薄膜的微观结构发生了如下变化:非晶→非晶+微晶→纳米多晶(结晶温度约为400℃),薄膜的磁致伸缩也发生了变化。值得注意的是,经过适当的退火处理后,Sm-Fe GMFs的磁致伸缩性将大大提高(在SOKA·m-1的施加磁场下,λ可以达到-350×10-6)。

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