首页> 外文会议>5th International Conference on Diffusion in Materials Pt.1, 5th, Jul 17-21, 2000, Paris France >Tracer Diffusion of Ni and Ge in L1_2-Type Intermetallic Compound Ni_3Ge
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Tracer Diffusion of Ni and Ge in L1_2-Type Intermetallic Compound Ni_3Ge

机译:Ni和Ge在L1_2型金属间化合物Ni_3Ge中的示踪扩散

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The diffusion coefficients of ~(63)Ni and ~(68)Ge in Ni_3Ge with three compositions from 23.2 to 24.5 at.% Ge have been measured by the conventional radioactive tracer technique in the temperature range from 1064 to 1323 K. The diffusion coefficient of Ge at 1223 K, for example, is from 100 to 300 times smaller than that of Ni. The diffusion coefficient of Ni is almost independent of composition, whereas that of Ge decreases with increasing the concentration of Ge towards the exact stoichiometry. On the basis of the experimental data, the mechanism of diffusion is discussed.
机译:通过常规放射性示踪技术在1064至1323 K的温度范围内测量了〜(63)Ni和〜(68)Ge在Ni_3Ge中具有23.2至24.5 at。%Ge的三种成分的扩散系数。例如,在1223 K时,Ge的电子密度比Ni小100到300倍。 Ni的扩散系数几乎与组成无关,而Ge的扩散系数随着Ge的浓度向精确的化学计量增加而降低。在实验数据的基础上,讨论了扩散机理。

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