首页> 外文会议>3rd International Symposium on Nanoporous Materials, Jun 12-15, 2002, Ottawa, Ontario, Canada >The modeling of wall structure of siliceous MCM-41 based on the formation process
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The modeling of wall structure of siliceous MCM-41 based on the formation process

机译:基于形成过程的硅质MCM-41壁结构建模

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The Monte Carlo and molecular dynamics methods in combination with a continuous electron density representation were applied to the framework modeling of siliceous MCM-41. The X-ray diffraction intensities calculated using a computer simulation technique were strongly influenced by an atomic disordering in the wall structure. Namely, the layer structure in the wall was shown to be fitted better than the amorphous structure. It was also found from the electron density maps that the wall structure of MCM-41 is not uniform, namely a large difference in the charge density exists. This indicates that an understanding of the formation process of MCM-41 is needed for the modeling.
机译:蒙特卡罗和分子动力学方法与连续电子密度表示相结合被应用于硅质MCM-41的框架建模。使用计算机模拟技术计算的X射线衍射强度受到壁结构中原子无序的强烈影响。即,显示出壁中的层结构比非晶结构更好地适合。从电子密度图还发现,MCM-41的壁结构不均匀,即电荷密度存在较大差异。这表明建模需要了解MCM-41的形成过程。

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