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Transitions Between Amorphous and Crystalline States Using Electrical Pulse in Tellurium-Based Semiconductor

机译:碲基半导体中电脉冲在非晶态和结晶态之间的转变

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The phase transitions between amorphous and crystalline states by applying electrical pulses in tellurium-based semiconductor at room temperature has been studied in this paper. The memory device was fabricated by a semiconductor thin film of composition GelO Te90 sandwiched between two metal electrodes. Binary states ‘0’ and ‘1’ may be assigned to the high resistive amorphous state and the low resistive crystalline state, respectively. High-speed write and erase operations in the memory device were induced by applying short and long electrical pulses. It was found that for the given write and erase conditions, about 3500 write-erase cycles were attained by the application of electrical pulses. It is observed that the write and erase operations can not be performed for the given write and erase pulses after 3500 number of cycles. The resistivity drop of the amorphous state of the memory device after a number of write-erase cycles is also discussed in this paper.
机译:通过在室温下在碲基半导体中施加电脉冲,研究了非晶态和结晶态之间的相变。该存储器件由夹在两个金属电极之间的组成为GelO Te90的半导体薄膜制成。二进制状态“ 0”和“ 1”可以分别分配给高电阻非晶态和低电阻晶态。通过施加短时和长时电脉冲,可以在存储设备中进行高速写入和擦除操作。已经发现,对于给定的写和擦除条件,通过施加电脉冲可获得大约3500个写-擦除周期。可以看出,在3500个周期后,不能对给定的写和擦除脉冲执行写和擦除操作。本文还讨论了在多次写擦除循环后存储设备非晶态的电阻率下降。

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