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Opening: Introduction to CAD contest at ICCAD 2012: CAD contest

机译:开幕:ICCAD 2012 CAD竞赛简介:CAD竞赛

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摘要

Contests and their benchmarks have become an important driving force to push our EDA domain forward in different areas lately, such as ISPD, TAU, DAC contests. To encourage better research development on timely and practical EDA problems across all domains, a new international CAD Contest is held this year under the joint sponsorship of the IEEE CEDA and Ministry of Education (MOE) of Taiwan. Three contest problems on functional ECO, placement, and litho hotspot identification are announced this year and run by industry experts from Cadence, IBM and Mentor Graphics.
机译:竞赛及其基准已经成为推动我们的EDA领域最近在不同领域前进的重要动力,例如ISPD,TAU和DAC竞赛。为了鼓励对所有领域的及时和实际EDA问题进行更好的研究开发,今年在IEEE CEDA和台湾教育部(MOE)的联合赞助下举办了新的国际CAD竞赛。今年宣布了有关功能性ECO,布局和光刻热点识别的三个竞赛问题,由Cadence,IBM和Mentor Graphics的行业专家负责。

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