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Vertically aligned CuInSe2 nanowire arrays on titanium coated glass substrates for photovoltaic applications

机译:在钛涂层玻璃基板上垂直排列的CuInSe2纳米线阵列,用于光伏应用

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Nanowire arrays of copper indium diselenide (CuInSe2) were fabricated using an electrochemical deposition process. Custom anodized aluminum oxide (AAO) membranes on a glass substrate with a Ti interlayer served as templates for this electrodeposition. Typical diameter of electrodeposited nanowires was 60 nm although process parameters for anodization could be varied in a controlled way to obtain pore diameters as low as 20 nm. Elemental composition of these CuInSe2 nanowires on titanium substrate was studied using energy dispersive x-ray analysis (EDX). The atomic percentage ratio for as deposited nanowires was Cu: In: Se= 1∶1.16∶2.53. The electrolyte composition and other deposition parameters were optimized in order to yield slightly In-rich structures because it is well known that such films result in better photovoltaic devices. It is thought that, with material properties ideally suited for photovoltaic (PV) applications, the use of CIS nanowire arrays would enable a new generation of PV device architectures.
机译:使用电化学沉积工艺制造了铜铟二硒化物(CuInSe2)的纳米线阵列。具有Ti夹层的玻璃基板上的定制阳极氧化氧化铝(AAO)膜用作此电沉积的模板。尽管可以以受控方式改变阳极氧化的工艺参数以获得低至20 nm的孔径,但电沉积纳米线的典型直径为60 nm。使用能量色散X射线分析(EDX)研究了钛基板上这些CuInSe2纳米线的元素组成。沉积的纳米线的原子百分比为Cu:In:Se = 1:1.1.16:2.53。优化电解质组成和其他沉积参数以产生稍微富In的结构,因为众所周知这种膜可产生更好的光伏器件。人们认为,由于具有理想地适合光伏(PV)应用的材料特性,CIS纳米线阵列的使用将使新一代PV器件架构成为可能。

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