首页> 外文会议>2008 MRS spring meeting symposium proceedings >Resistive Electrical Switching of Cu~+ and Ag~+ based Metal-Organic Charge Transfer Complexes
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Resistive Electrical Switching of Cu~+ and Ag~+ based Metal-Organic Charge Transfer Complexes

机译:Cu〜+和Ag〜+基金属有机电荷转移配合物的电阻电转换

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摘要

Memory cells based on Cu~+ and Ag~+ metal-organic charge-transfer complexes, as for example CuTCNQ (where TCNQ denotes 7,7',8,8'-tetracyanoquinodimethane), are well known for their bistable resistive electrical switching since 1979. The switching mechanism however remained unclear for very long time. In this contribution we describe the different views (bulk vs. interfacial switching), give evidence for interfacial switching in the case of CuTCNQ, and present a model allowing explaining the bipolar resistive electrical switching by an interfacial effect, even for experiments considered until now as proof for bulk switching. The proposed switching mechanism is based on bridging of an ion-permeable layer (or gap) by conductive Cu channels, which are formed and dissolved by an electrochemical reaction implying monovalent Cu~+ cations, originating from a solid ionic conductor (as for example CuTCNQ). The model was furthermore generalized to other memory systems consisting of a permeable layer and a solid ionic conductor, including also inorganic solid ionic conductors as for example Ag_2S.
机译:基于Cu〜+和Ag〜+金属-有机电荷转移复合物的存储单元,例如CuTCNQ(其中TCNQ表示7,7',8,8'-四氰基喹二甲烷),因其双稳态电阻式电开关而闻名,因为1979年。然而,转换机制在很长一段时间内仍不清楚。在本文中,我们描述了不同的观点(批量与界面转换),提供了在CuTCNQ情况下进行界面转换的证据,并提出了一个模型,该模型可以通过界面效应来解释双极电阻式电气开关,即使对于迄今为止被认为是批量交换的证明。所提出的转换机制基于通过导电性铜通道桥接离子可渗透层(或间隙),导电性铜通道是通过电化学反应形成和溶解的,该电化学反应暗示一价Cu〜+阳离子源自固态离子导体(例如CuTCNQ )。该模型进一步推广到其他由可渗透层和固体离子导体组成的存储系统,其中还包括无机固体离子导体,例如Ag_2S。

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  • 会议地点 San Francisco CA(US)
  • 作者单位

    PTSOLOPME, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

    rnPTSOLOPME, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium ESAT, Katholieke Universiteit Leuven, Kasteelpark Arenberg 10, Leuven, 3001, Belgium;

    rnPTSOLOPME, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

    rnPTCMOSRDMEMORY, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

    rnPTCMOSRDMEMORY, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

    rnPTSOLOPME, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

    rnESAT, Katholieke Universiteit Leuven, Kasteelpark Arenberg 10, Leuven, 3001, Belgium PTSOLO, IMEC v.z.w., Kapeldreef 75, Leuven, 3001, Belgium;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
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