Fabrication of Micropatterned Dielectric Thin Films on Self-Assembled Monolayers

摘要

Nucleation process of TiO_2 from a gaseous phase was well controlled in this paper. We present a novel process to realize selective deposition through heterogeneous nucleation and generate high-resolution micropatterns of TiO2 thin films from a gaseous phase. SAMs (self-assembled monolayers) of OTS (octadecyltrichloro-silane) were modified to generate methyl / silanol-pattern. They were used as templates to realize heterogeneous nucleation and deposit TiO_2 thin films on only silanol regions by the use of TDD (titanium dichloride diethoxide) from a gaseous phase. Homogeneous nucleation of TiO_2 particles was well inhibited by controlling atmosphere and resolution of this pattern was well below 2.1 %.