【24h】

Polarization Optimization Studies in the RHIC Optically-Pumped Polarized H~-Ion Source

机译:RHIC光学泵浦极化氢离子源中的极化优化研究

获取原文
获取原文并翻译 | 示例

摘要

The performance of the RHIC Optically-Pumped Polarized H~-Ion Source (OPPIS) in 2000-2002 runs in AGS and RHIC is reviewed. The OPPIS met the RHIC requirements for beam intensity with the reliable delivery of about 500 μA polarized H- ion current in 400 μs pulse duration (current can be increased to over 1.0 mA, if necessary). The beam intensity at 200 MeV was (5-6)·10~(11) H~-/pulse, which is sufficient to obtain the required 2·10~(11) polarized protons per bunch in RHIC. The polarization dilution by molecular ions, which are produced in the ECR primary proton source is discussed. The molecular component can be reduced to about 5% by further ECR source-operation optimization. The molecular component is suppressed by optimization of the extraction electrode optics and by the decelerating einzel lens in the 35 keV LEBT line. As a result, the proton polarization of the accelerated beam was increased to over 80%, as measured in the 200 MeV proton-deuterium polarimeter.
机译:回顾了在AGS和RHIC中运行的RHIC光学泵浦极化H +离子源(OPPIS)在2000-2002年的性能。 OPPIS可以在400μs的脉冲时间内可靠地传送约500μA极化H离子电流(满足需要,可以将电流增加到1.0 mA以上),从而满足RHIC对光束强度的要求。 200 MeV时的束流强度为(5-6)·10〜(11)H〜-/脉冲,足以在RHIC中获得每束所需的2·10〜(11)极化质子。讨论了由ECR初级质子源产生的分子离子对极化的稀释作用。通过进一步的ECR源操作优化,可以将分子成分降低到大约5%。通过优化引出电极光学器件和通过使einzel透镜减速至35 keV LEBT线,可抑制分子成分。结果,如在200 MeV质子-氘旋光计中测得的,加速束的质子极化增加到80%以上。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号