ELECTROCHEMICAL ANALYSIS OF COPPER CORROSIONIN THE CHLORIDE ION CONTAINED SOLUTIONSAT THE PRESENCE OF BENZOTRIAZOLE

摘要

Electrochemical impedance spectroscopy, polarization resistance, potential dynamics, andrnsurface analysis were used to characterize the corrosion inhibition of Benzotriazole(BTAH) on copperrnin the chloride ion contained solutions. For a fixed rotation speed of copper disk, the surface impedancernincreases with the increase of BTAH concentration or with the decrease of chloride ion concentration.rnBTAH is not effective for low pH values or at too high a chloride ion concentration. Nyquist plotrnshows that there are three time-constants at the presence of BTAH.rnSEM showed that BTAH inhibits the attack of chloride ion on copper at pH over 4, and at anrnintermediate BTAH concentration of 1x10-3 M. AFM indicated that there could be certain surfacerninstability at high BTAH concentrations. XRD and low angle reflectance FTIR analysis exhibitedrncopper surface consists a mixture of Cu2O, CuCl, and CuBTA complex.