首页>
外国专利>
Deposition of metal films and clusters by reactions of compounds with low energy electrons on surfaces
Deposition of metal films and clusters by reactions of compounds with low energy electrons on surfaces
展开▼
机译:通过化合物与低能电子在表面上的反应沉积金属膜和团簇
展开▼
页面导航
摘要
著录项
相似文献
摘要
A thin film of material such as metal is deposited on the surface of a substrate by placing a substrate (22) into a chamber (10) containing holder (12) cooled by heat exchanger 18. A beam (56) of U.V. light from the illumination source (42) is projected through monochromator (43), mask (46) and lens (16) onto a selected area (58) of the substrate at an energy level exceeding the photoemission threshold of the surface. A slow electron (60) is ejected from the surface into the capture zone (62). A compound AB such as iron pentacarbonyl from supply (30) is leaked into the chamber (10), enters the capture zone (60) to form a highly reactive deposition fragment A.sup.- which attaches to the surface and a dissociation fragment which is evacuated through outlet (14) . The deposited fragment may further dissociate to form metal deposit.
展开▼