首页> 外国专利> SCHOTTKY DIODE HAVING INCREASED ACTIVE SURFACE AREA WITH IMPROVED REVERSE BIAS CHARACTERISTICS AND METHOD OF FABRICATION

SCHOTTKY DIODE HAVING INCREASED ACTIVE SURFACE AREA WITH IMPROVED REVERSE BIAS CHARACTERISTICS AND METHOD OF FABRICATION

机译:具有改进的反向偏置特性的主动表面区域的肖特基二极管及其制造方法

摘要

A Schottky diode comprises a semiconductor body (10) of one conductivity type, the semiconductor body having a grooved surface, a metal layer (32) on the grooved surface and forming a Schottky junction with the semiconductor body. The semiconductor body preferably includes a silicon substrate with a grooved surface (12) being on a device region defined by a guard ring of a conductivity type opposite to the conductivity type of the semiconductor body, and a plurality of doped regions (30) at the bottom of grooves and forming P-N junctions with the semiconductor body. The P-N junctions of the doped regions form carrier depletion regions across and spaced from the grooves to increase the reverse bias breakdown voltage and reduce the reverse bias leakage current.
机译:肖特基二极管包括一种导电类型的半导体本体(10),该半导体本体具有凹槽表面,在该凹槽表面上的金属层(32)并且与该半导体本体形成肖特基结。半导体本体优选地包括硅衬底,该硅衬底具有在由与半导体本体的导电类型相反的导电类型的保护环限定的器件区域上的带凹槽的表面(12),以及在硅衬底上的多个掺杂区域(30)。凹槽的底部,并与半导体本体形成PN结。掺杂区的P-N结形成跨过凹槽并与凹槽间隔开的载流子耗尽区,以增加反向偏置击穿电压并减小反向偏置漏电流。

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