首页> 中文期刊> 《半导体光子学与技术:英文版》 >Correlation between Interfacial Oxides and Electrical Characteristics of GaN Schottky Diodes

Correlation between Interfacial Oxides and Electrical Characteristics of GaN Schottky Diodes

         

摘要

The electrical characteristics of GaN schottky diode with and without the interfacial oxides are compared in this paper. The influence of interfacial oxides on the electrical characteristics of the schottky diodes has been confirmed by the I-V,C-V measures. We find the barrier height have a reduction of 0.05 eV^0.1 eV. There is an interfacial insulating oxide with the thickness of 0.05 nm^0.1 nm after conventional cleaning. Either the forward or the backward currents increase. The backward punch through voltages are reduced to 50% and the capacitances have increased by 100%.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号