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< 50-mu m thin crystalline silicon heterojunction solar cells with dopant-free carrier-selective contacts

机译:<50-mu m薄的晶体硅杂核函数电池,具有掺杂剂的载体选择性接触

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Dopant-free carrier-selective contacts are emerging in the field of crystalline silicon (c-Si) photovoltaic solar cells, which are potential to further improve the power conversion efficiency (PCE) and lower the cost of c-Si solar cells. Here, we demonstrate tens of microns thin c-Si heterojunction solar cells with substochiometric MoOx and LiFx as dopant-free hole- and electron-selective contacts, respectively. Chemical thinning of 200-mu m thick c-Si wafers enables the production of proof of concept devices with good flexibility and strong performance. When the wafer thickness is reduced to 49.4 mu m (24.7% of the initial thickness), the power conversion efficiency (PCE) of the solar cell still maintains 88.2% of the initial value for the 200-mu m thick cell. When the wafer thickness becomes less than 10% (or even 3.4%) of the initial value, 61.2% and 39.2% of the initial PCEs are still achieved for the 14.8- and 6.8-mu m thick cells, respectively. Passivating and carrier-selective effects of the MoOx and LiFx films allow for the maintenance of performance. An oxide interlayer at the MoOx/c-Si interface passivates the dangling bonds of the c-Si surface and improves the minority carrier lifetime. Field-effect passivation and carrier-selective effects induced by the band bending near the MoOx/c-Si interface and the Al/LiFx/c-Si interface play an important role in maintaining high open-circuit voltage and high fill factor. To the best of our knowledge, this is the first time that <100-mu m thin c-Si heterojunction solar cells are reported with undoped contacts. Our solar cells have been fabricated on thin c-Si wafers with low-temperature processes and without additional doping, and thus our work provides a promising cost-effective means in the field of thin and flexible c-Si solar cells.
机译:掺杂剂的载体选择性触点在晶体硅(C-Si)光伏太阳能电池领域中出现,这是进一步提高功率转换效率(PCE)的潜力并降低C-Si太阳能电池的成本。这里,我们分别展示了几十微米薄C-Si异质结太阳能电池,分别是无掺杂剂的孔和电子选择性触点。 200-MU M厚的C-Si晶片的化学变薄使得能够生产具有良好的灵活性和强大性能的概念设备。当晶片厚度降低到49.4μm(初始厚度的24.7%)时,太阳能电池的功率转换效率(PCE)仍然保持了200-mu M厚电池的初始值的88.2%。当晶片厚度小于10%(或甚至3.4%)的初始值时,分别为14.8-8-80μm厚细胞仍然达到初始PCE的61.2%和39.2%。 MOOX和LIFX薄膜的钝化和载波选择性效果允许维持性能。 MOOX / C-Si界面处的氧化物中间层钝化C-Si表面的悬空键并改善少数载体寿命。由MOOX / C-SI接口附近的带弯曲和AL / LIFX / C-Si接口附近的带弯曲引起的现场效应钝化和载波选择效果在维持高开路电压和高填充因子方面发挥着重要作用。据我们所知,这是第一次<100-MU M薄的C-Si异质结太阳能电池与未掺杂的触点报告。我们的太阳能电池已在薄C-Si晶片上制造,具有低温工艺,无需额外的兴奋剂,因此我们的工作在薄且柔性C-Si太阳能电池领域提供了有希望的成本效益手段。

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