MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN USING HARDMASK COMPOSITION

摘要

The present invention relates to a monomer for a hardmask composition represented by chemical formula 1, a hardmask composition including the monomer, and a method for forming a pattern using the hardmask composition. For chemical formula 1, the definitions of A, A, X, Y, I, m, and n are the same as those defined in the specification.;COPYRIGHT KIPO 2014