首页>
外国专利>
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
展开▼
机译:用于哈姆达克组合物的单体和包括该单体的哈姆达克组合物和使用该哈姆达克组合物形成图案的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A hard mask composition comprising the monomer, and a pattern forming method using the same. [Chemical Formula 1] A, A ', L, X, X', X "and k, m and n are as defined in the specification.
展开▼