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Structural, electronic and magnetic properties of manganese doping in the upper layer of bilayer graphene

机译:双层石墨烯上层中锰掺杂的结构,电子和磁性

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First-principles spin-polarized calculations have been conducted to investigate the structural, electronic and magnetic properties of 3d transition metal Mn doping into two typical sites in the upper layer of bilayer graphene with the AB Bernal structure. One of the doping sites is above the center of a carbon hexagon of the lower graphene layer (called the H site) and the other is directly on top of a carbon atom of the lower graphene layer (called the T site). We found that Mn doping enlarges the interlayer distance in bilayer graphene. Charge density distribution indicates that the region between the upper and lower graphene layer has apparent covalent-bonding characters due to the Mn doping. In the spin-polarized band structure of H site doping, the pi and pi* bands separate from each other at the Dirac point both in majority spin and minority spin. In the band structure of T site doping, the Fermi level is located above the Dirac point and moves to the conduction bands in majority spin and minority spin, making the bilayer graphene n doped. A high spin polarization of 95% is achieved due to the H site doping. The local moment of Mn for H and T site doping is reduced to 1.76 mu(B) and 1.88 mu(B), respectively, which are smaller than the value (5 mu(B)) in the free state.
机译:进行了第一性原理自旋极化计算,以研究3d过渡金属Mn掺入具有AB Bernal结构的双层石墨烯上层中两个典型位置的结构,电子和磁性。掺杂位点之一位于下石墨烯层的碳六边形的中心(称为H位点)上方,另一个正好位于下石墨烯层的碳原子的顶部(称为T位点)上。我们发现,Mn掺杂会增加双层石墨烯的层间距离。电荷密度分布表明,由于Mn掺杂,上下石墨烯层之间的区域具有明显的共价键特征。在H位点掺杂的自旋极化能带结构中,多数自旋和少数自旋都在狄拉克点处彼此分开。在T位点掺杂的能带结构中,费米能级位于狄拉克点上方,并移至多数自旋和少数自旋的导带,从而使双层石墨烯n被掺杂。由于H位点掺杂,实现了95%的高自旋极化。用于H和T位置掺杂的Mn的局部矩分别减小到1.76 mu(B)和1.88 mu(B),这比自由状态下的值(5 mu(B))小。

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