Low cost fabrication of the large-area anti-reflection films from polymer by nanoimprint/hot-embossing technology

摘要

In this paper, we present a low cost approach to produce large-area polymer sheets with sub-wavelength nanostructures. The fabricated polymer films would have great potentials to attach to optical or solar-cell-related consumer products when anti-reflection/anti-glaring is mandatory. We employed a special electron cyclotron resonance (ECR) plasma process to fabricate the SWSs with large area directly on silicon substrates. Homogeneously distributed nanotips on the full 4 inch silicon substrate were fabricated by using gas mixtures of silane, methane, argon and hydrogen. An Ni-Co metal mold with a hardness of 550 HV was produced through the replication of the Si mold by electroplating. Afterwards, the molding process was applied to manufacture the nanostructures in PMMA plates in large volume. The nanostructures in PMMA plates with aspect ratios of 4 and diameters of 150 nm were fabricated. The fabricated PMMA sheets could generate the gradient of the refractive indices, absorb the light and greatly reduce the reflectivity. Compared with the PMMA without SWSs, the reflectivity of PMMA with SWSs decreased dramatically from 4.25% to 0.5% at the wavelength of light from 400 to 800 nm.