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Study of Local Lattice Relaxation of Substitutional Impurities in Silicon and Germanium

机译:硅和锗中取代杂质的局部晶格弛豫研究

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摘要

Local lattice relaxation of substitutional donors in silicon investigated using self-consistent multiple scattering X_alpha (MSXa) method within the framework of the standard muffin-tin potential approximation is extended to substitutional donors in germanium and substitutional acceptors in both silicon and germanium.Incorporating the effect of lattice relaxation surrounding the impurity makes the model suitable for both shallow and deep levels.Chemical trends of some aspects of impurity states,such as local lattice relaxation and charge transfer,of the impurities both in silicon and germanium are inferred.
机译:在标准松饼-锡电势近似框架内使用自洽多重散射X_alpha(MSXa)方法研究的硅中取代供体的局部晶格弛豫扩展到锗中的取代供体以及硅和锗中的取代受体。杂质周围晶格弛豫的模型使得该模型适用于浅层和深层。推论了硅和锗中杂质态某些方面的化学趋势,例如局部晶格弛豫和电荷转移。

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