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Comparative study of the roughness of optical surfaces and thin films by use of x-ray scattering and atomic force microscopy

机译:X射线散射和原子力显微镜对光学表面和薄膜粗糙度的比较研究

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摘要

The surface roughness of polished glass substrates and optical thin-film coatings is studied with atomic force microscopy and x-ray scattering. It is demonstrated that both methods permit the determination of power spectral density functions in a wide range of spatial frequencies. The results are in good quantitative agreement.
机译:利用原子力显微镜和X射线散射研究了抛光玻璃基板和光学薄膜涂层的表面粗糙度。证明了这两种方法都可以在很大的空间频率范围内确定功率谱密度函数。结果与定量结果吻合良好。

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