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Atomic-scale evidence for potential barriers and strong carrier scattering at graphene grain boundaries: A scanning tunneling microscopy study

机译:石墨烯晶界潜在势垒和强载流子散射的原子尺度证据:扫描隧道显微镜研究

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We use scanning tunneling microscopy and spectroscopy to examine the electronic nature of grain boundaries (GBs) in polycrystalline graphene grown by chemical vapor deposition (CVD) on Cu foil and transferred to SiO_2 substrates. We find no preferential orientation angle between grains, and the GBs are continuous across graphene wrinkles and SiO_2 topography. Scanning tunneling spectroscopy shows enhanced empty states tunneling conductance for most of the GBs and a shift toward more n-type behavior compared to the bulk of the graphene. We also observe standing wave patterns adjacent to GBs propagating in a zigzag direction with a decay length of ~1 nm. Fourier analysis of these patterns indicates that backscattering and intervalley scattering are the dominant mechanisms responsible for the mobility reduction in the presence of GBs in CVD-grown graphene.
机译:我们使用扫描隧道显微镜和光谱法检查通过铜箔上的化学气相沉积(CVD)生长并转移到SiO_2衬底上的多晶石墨烯中晶界(GBs)的电子性质。我们发现晶粒之间没有优先的取向角,并且GBs在石墨烯皱纹和SiO_2形貌上是连续的。扫描隧穿光谱法显示,大多数GB的空态隧穿电导增强,并且与大部分石墨烯相比,向更多的n型行为转变。我们还观察到与GBs相邻的驻波模式在Z字形方向传播,衰减长度约为1 nm。对这些模式的傅立叶分析表明,背向散射和居间散射是造成CVD生长石墨烯中存在GBs时迁移率降低的主要机制。

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