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Molecular Oxygen Induced in-Gap States in PbS Quantum Dots

机译:PbS量子点中分子氧诱导的能隙状态。

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Artificial solids composed of semiconductor quantum dots (QDs) are being developed for large-area electronic and optoelec-tronic applications, but these materials often have defect-induced in-gap states (IGS) of unknown chemical origin. Here we performed scanning probe based spectroscopic analysis and density functional theory calculations to determine the nature of such states and their electronic structure. We found that IGS near the valence band occur frequently in the QDs except when treated with reducing agents. Calculations on various possible defects and chemical spectroscopy revealed that molecular oxygen is most likely at the origin of these IGS. We expect this impurity-induced deep IGS to be a common occurrence in ionic semiconductors, where the intrinsic vacancy defects either do not produce IGS or produce shallow states near band edges. Ionic QDs with surface passivation to block impurity adsorption are thus ideal for high-efficiency optoelectronic device applications.
机译:由半导体量子点(QD)组成的人造固体正在开发用于大面积电子和光电应用,但是这些材料通常具有未知化学起源的缺陷诱导的能隙状态(IGS)。在这里,我们进行了基于扫描探针的光谱分析和密度泛函理论计算,以确定此类状态及其电子结构的性质。我们发现价位带附近的IGS在QD中频繁发生,除非用还原剂处理。通过对各种可能的缺陷和化学光谱的计算发现,分子氧最有可能是这些IGS的起源。我们希望这种杂质引起的深层IGS在离子半导体中很常见,在该半导体中,固有的空位缺陷要么不产生IGS,要么在能带边缘附近产生浅态。因此,具有表面钝化作用以阻止杂质吸附的离子QD非常适合于高效光电器件应用。

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