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Hybrid graphene heterojunction photodetector with high infrared responsivity through barrier tailoring

机译:通过屏障剪裁,具有高红外响应性的混合石墨烯异质结光电探测器

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摘要

The graphene/Si heterojunction is attractive for high gain and broadband photodetection through photogating effect. However, the photoresponsivity in these devices are still limited to under 1 A W-1 if no narrowband absorption-enhanced nanostructures were used. In this paper, the effects of barriers on photoresponse are systematically studied at 1550 nm wavelength. Different barrier heights are obtained through selection of substrates, graphene doping and electrical tuning. Lower barrier height for graphene side and higher barrier height for silicon side are found to be beneficial for better infrared photoresponse. Through Polyetherimide doping of graphene and back-gated electrical modulation, the responsivity finally reached 5.71 A W-1, which to our knowledge is among the best results for graphene-based infrared photodetectors with graphene adopted as a light-absorption material. It is found that the thermionic emission efficiency of indirect transition in graphene is related to the difference in emissioin barrier height, and the lifetime of photoinduced carriers in the channel can be enhanced by built-in potential. These results lay the foundation for the photodetection applicatioins of graphene/Si heterojunction in the longer-wavelength infrared region.
机译:石墨烯/ Si异质结具有通过光通效效果的高增益和宽带光检测吸引力。然而,如果没有使用窄带吸收增强的纳米结构,则这些器件中的光反应性仍然限于1A W-1。在本文中,在1550nm波长下系统地研究了光响应对光响应的影响。通过选择基板,石墨烯掺杂和电学调谐获得不同的阻挡高度。发现石墨烯侧的较低屏障高度和硅侧的较高屏障高度对于更好的红外光响应是有益的。通过聚醚酰亚胺掺杂石墨烯和背门电气调制,响应率最终达到5.71A W-1,这对我们的知识是基于石墨烯的红外光电探测器作为光吸收材料的最佳结果。结果发现,石墨烯中间接转变的热离子发射效率与发光势态阻挡高度的差异有关,并且通过内置电位可以增强通道中的光抑制载体的寿命。这些结果为较长波长红外区域中石墨烯/ Si异质结的光检测应用的基础。

著录项

  • 来源
    《Nanotechnology》 |2019年第19期|共7页
  • 作者单位

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chongqing Univ Technol Dept Appl Phys Chongqing 400054 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

    Chinese Acad Sci Chongqing Inst Green &

    Intelligent Technol Key Lab Multiscale Mfg Technol Chongqing 400714 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    graphene; silicon; Schottky junction; barrier height; infrared photodetector;

    机译:石墨烯;硅;肖特基交界处;屏障高度;红外光电探测器;

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