Metal-organic chemical vapour deposition of lead scandium tantalate: chemical issues and precursor selection

摘要

MOCVD is a promising technique for the deposition of the pyroelectric oxide lead scandium tantalate, Pb(Sc0.5Ta0.5)O-3. In order to exploit the full potential of the method, it is important to identify the optimum combination of precursors so that process parameters and film properties are optimised. In this paper, issues involved in the selection of suitable Pb, Sc and Ta precursors are discussed and the molecular design of new Ta and Sc sources is described. It is shown how the use of carefully matched precursors allows the growth of Pb(Sc0.5Ta0.5)O-3 in the required perovskite phase at low substrate temperatures. (C) 2000 Elsevier Science Ltd All rights reserved. [References: 24]