脉冲激光沉积制备非晶La0.75Sr0.25MnO3薄膜用于半透明阻变存储器

摘要

Amorphous La0.75Sr0.25MnO3 (a-LSMO) was deposited by pulsed laser deposition (PLD) as an interlayer of a resistive-switching device (Ag/a-LSMO/ITO) with good non-volatile and bipolar resistance switching behaviour.Bottom ITO substrate and ultra-thin a-LSMO layer allow semi-transparent device fabrication.The formation of Ag filament connected from Ag electrode to ITO electrode is directly observed in the cross-sectional image by the high-resolution transmission electron microscope (HRTEM).The resistive switching in the device is attributed to the growth and dissolution of Ag filament in the amorphous LSMO layer.%用脉冲激光沉积方法制备非晶La0.75Sr0.25MnO3(a-LSMO)薄膜作为阻变器件(Ag/a-LSMO/ITO)的中间层,所得器件具有良好的非易失性和双极阻变行为.ITO衬底及超薄a-LSMO薄膜具有很高的可见光透过率,从而可制备半透明阻变器件.通过高分辨透射电镜直接观测到了在银电极与ITO电极间的银导电细丝.器件的阻变特性归因于在非晶镧锶锰氧层中的银导电细丝的生长与断裂.