An analytical threshold voltage model to study the scaling capability of deep submicron double-gate GaN-MESFETs

摘要

In this work, a deep submicron double-gate (DG) Gallium Nitride (GaN)-MESFET design and its 2-D threshold analytical model have been proposed and expected to suppress the short-channel-effects for deep submicron GaN-MESFET-based low power applications. The model predicts that the threshold voltage is greatly improved in comparison with the conventional Single-Gate GaN-MESFET. The developed approaches are verified and validated by the good agreement found with the 2D numerical simulations for wide range of device parameters and bias conditions. DG GaN-MESFET can alleviate the critical problem and further improve the immunity of short-channel-effects of GaN-MESFET-based circuits in the low power deep submicron devices.