首页> 外文会议>Meeting of the Electrochemical Society >Effect of pulse frequency on structural and thermoelectric properties of bismuth telluride thin films by electrodeposition
【24h】

Effect of pulse frequency on structural and thermoelectric properties of bismuth telluride thin films by electrodeposition

机译:脉冲频率对碲化铋薄膜结构和热电性能电沉积的影响

获取原文

摘要

Effects of current pulse frequency and duty ratio [off-time/(on-time + off-time)] on thermoelectric properties of bismuth telluride (Bi_2Te_3) thin films were investigated. The crystal structure of the Bi_2Te_3 thin films was strongly affected by the duty ratio rather than the current pulse frequency. In particular, the Bi_2Te_3 thin films were highly oriented along (110) direction with smooth surface at the high current pulse frequency (5000 Hz) and the high duty ratio (80%). Overall, the electrical conductivities of the Bi_2Te_3 thin films with current pulse frequency of 5000 Hz were larger than that the thin films with 1000 Hz, whereas the Seebeck coefficients were mostly the same between the both frequencies. As a result, the highest power factor (1.1 μW/(cm·K~2)) was observed at the Bi_2Te_3 thin films with a current pulse frequency of 5000 Hz and a duty ratio of 60%.
机译:研究了电流脉冲频率和占空比[OFF-TIME + OFF-TIME)对碲化铋(BI_2TE_3)薄膜的热电性能的影响。 Bi_2Te_3薄膜的晶体结构受占空比而不是电流脉冲频率的强烈影响。特别地,Bi_2Te_3薄膜沿(110)方向高度取向,在高电流脉冲频率(5000Hz)和高占空比(80%)处具有光滑的表面。总的来说,具有5000Hz的电流脉冲频率的Bi_2te_3薄膜的电导率大于1000Hz的薄膜,而塞贝克系数在两个频率之间大多是相同的。结果,在Bi_2Te_3薄膜上观察到最高功率因数(1.1μW/(cm·k〜2)),其电流脉冲频率为5000Hz,占空比为60%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号