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High Phosphorous Electroless Nickel Process for Mobile Phone PWBs

机译:手机电路板的高磷化学镀镍工艺

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An Electroless Nickel and Immersion Gold (ENIG) plating process with a middle phosphorous content nickel layer isrncurrently a mainstream final finishing application for mobile phone Printed Wiring Boards (PWB). As a trend according tornthe worldwide market growth of mobile phones, the demand for higher resistance characteristics in corrosive environmentsrnfor ENIG finished boards has increased. Although various methods have been introduced as an evaluation method for higherrncorrosion resistance, sulfurous acid gas (SO_2 gas) testing is a recent area of industry focus. However, because of thernsignificant corrosive characteristic of SO_2 gas, the conventional ENIG layer cannot tolerate this testing method, and thus hasrnbecome an area of major concern. As a result, a high phosphorous nickel ENIG plating process, which inhibits higherrnresistance in a corrosive environment compared to a middle phosphorous process, is being adopted as a final finishingrnmethod. However, several other factors of the total plating process that may influence corrosion resistance have not beenrnverified or fully investigated. Therefore, in this study we introduce ENIG plating layer characteristics required for higherrnresistance in corrosive environments by investigating corrosion conditions of ENIG layers caused by SO_2 gas testing, andrnfurthermore conduct observations on factors that influence these ENIG characteristics.
机译:具有中等磷含量镍层的化学镍和浸金(ENIG)电镀工艺目前是手机印刷线路板(PWB)的主流最终涂饰应用。随着全球手机市场增长的趋势,ENIG成品板在腐蚀性环境中对更高电阻特性的需求不断增长。尽管已经引入了各种方法作为用于更高耐腐蚀性的评估方法,但是亚硫酸气体(SO 2气体)测试是近来工业关注的领域。然而,由于SO_2气体的腐蚀性极强,常规的ENIG层不能耐受该测试方法,因此成为主要关注的领域。结果,采用高磷镍ENIG电镀工艺作为最终精加工方法,与中等磷工艺相比,该工艺在腐蚀性环境中抑制了更高的电阻。但是,总电镀过程中可能影响耐腐蚀性的其他几个因素尚未得到证实或充分研究。因此,在本研究中,我们通过研究SO_2气体测试引起的ENIG层的腐蚀条件,介绍了在腐蚀性环境中具有更高耐性所需的ENIG镀层特性,并进一步观察了影响这些ENIG特性的因素。

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