CVD METHOD AND APPARATUS OF REMOTE PLASMAS FLOWABLE CVD CHAMBER

摘要

Embodiments disclosed herein relate generally to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chamber body that defines a plasma field and a processing region. A chamber seasoning system is coupled to the processing chamber. The chamber seasoning system is configured to season the processing region and the plasma field. A remote plasma cleaning system is in communication with the processing chamber. The remote plasma cleaning system is configured to clean the processing region and the plasma field.