首页> 外国专利> SIMULATION METHOD FOR CHARACTERISTICS OF TRANSISTOR, SIMULATION METHOD FOR CHARACTERISTICS OF ELECTRONIC CIRCUIT INCLUDING TRANSISTOR, AND NONTRANSITORY RECORDING MEDIUM THAT STORES SIMULATION PROGRAM FOR CHARACTERISTICS OF TRANSISTOR

SIMULATION METHOD FOR CHARACTERISTICS OF TRANSISTOR, SIMULATION METHOD FOR CHARACTERISTICS OF ELECTRONIC CIRCUIT INCLUDING TRANSISTOR, AND NONTRANSITORY RECORDING MEDIUM THAT STORES SIMULATION PROGRAM FOR CHARACTERISTICS OF TRANSISTOR

机译:用于晶体管特性的仿真方法,电子电路特性模拟方法,包括晶体管的非传输记录介质,用于晶体管特性的仿真程序

摘要

A simulation method includes a process of calculating a transient charge density qT of trapped charges after applying a voltage between a gate electrode and a semiconductor layer of a transistor, the charge density qT being calculated with a time variance of the charge density qT being expressed by a function obtained by superimposing multiple exponential functions having mutually different time constants.
机译:仿真方法包括计算在栅极电极和晶体管的半导体层之间的电压之后计算截止电荷的瞬态电荷密度q t 的过程,电荷密度q t t 的时间方差计算,通过叠加具有相互不同的时间常数的多个指数函数来表示的函数。

著录项

  • 公开/公告号US2021232746A1

    专利类型

  • 公开/公告日2021-07-29

    原文格式PDF

  • 申请/专利权人 WUHAN TIANMA MICRO-ELECTRONICS CO. LTD.;

    申请/专利号US202117153943

  • 发明设计人 GENSHIRO KAWACHI;

    申请日2021-01-21

  • 分类号G06F30/367;G06F30/3312;G06F30/396;

  • 国家 US

  • 入库时间 2022-08-24 20:13:55

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