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SOI CMOS CMOS INTERFACE CIRCUIT FORMED IN SILICON-ON-INSULATOR SUBSTRATE

机译:绝缘硅衬底上形成的SOI CMOS CMOS接口电路

摘要

CMOS circuits formed on silicon-on-insulator (SOI) substrates include MOSFETs, which include drains and diffusers that extend through the silicon layer to the surface of the insulating layer. Each of the drains of the N-channel and P-channel MOSFETs is also provided as a terminal (anode and cathode) of a diode connected in series with the MOSFET. This structure allows the CMOS device to be manufactured as a fully symmetrical structure without having additional processing steps other than the processing steps common to fabricating conventional CMOS devices.
机译:在绝缘体上硅(SOI)衬底上形成的CMOS电路包括MOSFET,该MOSFET的漏极和扩散层穿过硅层延伸到绝缘层的表面。 N沟道和P沟道MOSFET的每个漏极也被提供为与MOSFET串联连接的二极管的端子(阳极和阴极)。这种结构允许将CMOS器件制造为完全对称的结构,而不需要除制造常规CMOS器件所共有的处理步骤以外的其他处理步骤。

著录项

  • 公开/公告号KR100383357B1

    专利类型

  • 公开/公告日2003-07-18

    原文格式PDF

  • 申请/专利权人 내셔널 세미콘덕터 코포레이션;

    申请/专利号KR19960707480

  • 发明设计人 메릴 리차드 비.;

    申请日1996-12-27

  • 分类号H01L27/12;

  • 国家 KR

  • 入库时间 2022-08-21 23:45:27

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