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Pulsed bias having high pulse frequency for filling gaps with dielectric material
Pulsed bias having high pulse frequency for filling gaps with dielectric material
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机译:具有高脉冲频率的脉冲偏压,用于用介电材料填充间隙
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摘要
During bottom filling of high aspect ratio gaps and trenches in an integrated circuit substrate using HDP-CVD, a pulsed HF bias is applied to the substrate. In some embodiments, pulsed HF bias is applied to the substrate during etching operations. The pulsed bias typically has a pulse frequency in a range of about from 500 Hz to 20 kHz and a duty cycle in a range of about from 0.1 to 0.95.
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